Thursday, June 10, 2010
IMEC expands fab, strikes lab deal with Intel
IMEC will expand its 300-mm wafer clean room where it will install later this year the ASML NXE 3100 EUV lithography system believed to be key to making chips at design pitches of 22-nm and smaller. The new site will also do research on 450-mm wafers. Separately IMEC is building a new headquarters building that will also add lab space in areas such as biotechnology.