BAD HARDWARE WEEK

Applied Materials, Inc. today announced its breakthrough Applied Producer(R) Eterna(TM) FCVD(TM) (Flowable CVD(1)) system, the first and only film deposition technology capable of electrically isolating the densely-packed transistors in 20nm-and-below memory and logic chip designs with a high-quality dielectric film. The system will enable NAND skyscraper (3d NAND memory) wafers with 256 gigabyte NAND flash chips. It will also enable the creation of complex finfet transistors which are needed for faster and lower power chips. It will also enable DRaM 4F2 8 gigabit DDR4.